Physics in the Industry

Chair Information
Ron Naftali
Orenstein 102

Lectures for this program:

Lecture Time Speaker Lecture subject
14:15-14:45 (invited) Mike Adel Symmetry in the service of lithographic process control – an overview of overlay metrology techniques for the 7 nm device node
Whereby semiconductor device pitch is bounded by physical limits such as illumination wavelength and numerical apertur...
14:45-15:00 Haim Feldman Speckles Reduction for an Aerial Inspection Tool, Laser Illuminator.
Speckles Reduction for an Aerial Inspection Tool, Laser Illuminator[1].
15:00-15:15 Asher Yahalom Momentum conservation in a relativistic engine
In a previous paper we have shown that Newton’s third law cannot strictly hold in a distributed system of which the diff...
15:15-15:30 Yiftah Silver Laboratory Plasma Physics
15:30-15:45 Shraga Tsur Overcoming the 193nm imaging sensor lifetime obstacle
DUV radiation damage of the imaging sensor limits the lifetime of current Wafer/Mask Inspection (MI) cameras.